Comprehensive advanced analytical services spanning X-ray diffraction, photoelectron spectroscopy, surface chemistry analysis, thermal characterization, and mass spectrometry.
Identifies crystalline phases, determines lattice parameters, and measures strain in thin films and bulk materials. Supports GIXRD for thin-film analysis and pole figure measurements for texture analysis.
A surface-sensitive technique for elemental composition, chemical state, and electronic state analysis of surfaces and thin films.
Characterizes nanostructure, particle size, and morphology of soft materials, nanoparticles, and thin films in solution or bulk form.
A surface-sensitive elemental analysis technique with high spatial resolution (~10 nm) for depth profiling and elemental mapping.
Provides depth profiling and trace element analysis of thin films and bulk materials with sub-ppm detection limits.
A non-destructive ion beam technique for quantitative elemental depth profiling of thin films without reference standards.
Measures heat flow associated with thermal transitions including melting, crystallization, glass transitions, and chemical reactions.
Measures mass changes as a function of temperature to characterize thermal stability, decomposition, and composition of materials.
Provides wide-range electrical characterization of devices, materials, semiconductors, and active/passive components.
Ultra-trace elemental analysis technique capable of detecting elements at parts-per-trillion concentrations.
A soft ionization mass spectrometry technique for analyzing large biomolecules, polymers, and nanomaterials.